Plasma etching of Si and SiO2 in sf6 gas–O2 mixtures: Journal of

Jun 04, 1998 · With an SF 6 ‐O 2 mixture in the absence of silicon, the final reaction products are F 2, SOF 4, and SO 2 F 2. The product distribution was unaffected by small SiO 2 substrates. When Si is etched, SiF 4 is the only stable silicon‐containing etch product and SOF 2 is formed in oxygen‐poor mixtures.Get price

(PDF) Plasma etching of Si and SiO2 in sf 6–O2 mixtures

Fluorine-containing plasmas generated from gases such as NF 3 , SF 6 , and CF 4 /O 2 are commonly used to etch silicon in applications requiring high etching rates. 1-3 Rapid isotropic chemicalGet price

New SI-traceable reference gas mixtures for sulfur

We developed two SI-traceable methods, using both static and dynamic preparation steps, to produce reference gas mixtures for sulfur hexafluoride (Sulfr hexafluoride) in gas cylinders at pmol/mol level. This research activity is conducted under the framework of the European EMRP HIGHGAS project, in support of the high quality measurements of this important greenhouse gas in the earthatmosphere. In theGet price

(PDF) Fluoronitrile/CO 2 mixture as an eco-friendly

Mixed with CO2 buffer gas, the Novec 4710 mixtures offer excellent dielectric properties and the possibility to be used as an eco-friendly alternative to gaz sf6 for medium voltage switchgears.Get price

Dielectric properties of SF 6 mixtures containing oxygen and

To check the results and for other practical reasons the method of the Boltzmann equation was applied to the Sulfr hexafluoride + He and Sulfr hexafluoride + N2 mixtures, the dielectric strength of which had already been explored by other authors. In comparison with other mixtures currently studied the sf 6 + O2 mixture reveals rather poor dielectric properties.Get price

Silicon nitride etch characteristics in insulating gas/O2 and C3F6O/O2

The effects of the working pressure and gas flow ratio on the Si 3 N 4 etch rate were initially examined for each gas mixture. The Si 3 N 4 etch rates was compared for the SF 6 /O 2 and C 3 F 6 O/O 2 etch gas mixtures under the same process conditions. The by-product gases generated during etching were analyzed and their concentrations wereGet price

SimulationsofSiandSiO EtchinginSF +O Plasma

ponent of gas mixture, 'i is the flow rate of the i-th component,andV0 isthereactorvolume. 2.2. SiO2 etching The PCE of a quartz substrate in a Sulfr hexafluoride+O2 plasma is considered. During PCE of SiO2 in gaz sf6+O2 plasma, fluorination reactions take place [7]. F atoms from the plasmareactwithSiO2 molecules: SiO2 +4F! SiF4 +O2: (4Get price

N2/Sulfr hexafluoride gas Mixtures — Large Scale Application in Gas

The application of N2/sf6 gas gas mixtures with Sulfr hexafluoride-contents between 10 % and 20 % reduces the costs for the insulating gas remarkably. This is of great importance when GIL is to be used for long...Get price

Measurement of the ionisation and attachment coefficients in

fractional sf 6 partial pressure k at fixed E/pzo. 3.1. The Townsend first ionisation a/p~ and attachment q/pza coeficients The values of dp20 for insulating gas and air mixtures are shown in figure 1. A comparison with the values in the literature shows that the present values of dpzO for Sulfr hexafluoride are in goodGet price

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We investigated the variation of atomic oxygen density for various mixtures of O2/insulating gas and report a significant five-fold increase of [O] when oxygen plasma was diluted with sf 6 by only 5%. We attribute this increase in [O] to a combination of a change in surface conditions caused by constituents of gaz sf6 plasma reacting with the reactor walls andGet price

High-aspect-ratio deep Si etching in sf6 gas/O2 plasma. II

Jul 28, 2010 · In this article, the authors focus on the profiles formed by high-aspect-ratio deep Si etching with sf6 gas/O2 plasma mixtures. One of the most serious problems for deep Si etching processes is lateral...Get price

Atmospheric chemistry of dimethyl sulfide. Kinetics of the

Apr 21, 1995 · All reagents were used as received. 3. Results Following the pulse radiolysis of insulating gas/DMS/ O2/NO2 mixtures a rapid decrease in UV absorp- tion at 400 nm was observed. Fig. 1 shows typical data obtained following radiolysis of a mixture of 5 mbar of DMS, 45 mbar of 02, 0.7 mbar of NO2 and 950 mbar of Sulfr hexafluoride.Get price


alternative to sf 6 with similar or better performances on the whole range of electrical fields and temperature of use. Figure 2: BIL dielectric withstand of different gases with gas mixture corresponding to -15°C conditions Another interesting candidate is Fluoronitrile [1], it has higher dielectric properties than sf6 gas for MV use at 1.3Get price

Application of non-Sulfr hexafluoride gases or gas-mixtures in medium

This Technical Brochure describes the needs for adaptations or new requirements for the safe, reliable and sustainable application of non-sf6 gas gases and gas mixtures in gas-insulated switchgear. It describes the given and available properties of the non-Sulfr hexafluoride gases and gas-mixtures which have been investigated and applied to gas-insulated switchgear in MV and HV. This Technical Brochure alsoGet price

[PDF] Anisotrapic Reactive Ion Etching of Silicon Using SF 6

Reactive ion etching of silicon in an RF parallel plate system, using gaz sf6/O2/CHF3, plasmas has been studied. Etching behavior was found to be a function of loading, the cathode material, and the mask material. Good results with respect to reproducibility and uniformity have been obtained by using silicon as the cathode material and silicon dioxide as the masking material for mask designs whereGet price

Application of sf 6 mixture gases in GIS in Northern China

Mixture Handling Clearly, since the population of SF 6 mixtures circuit breakers in China continues to grow, and some of the handling procedures for pure SF 6 are not valid for handling SF 6 mixtures, a number of other issues need to be addressed and one of them pertains to information on preparation, recycling, and handling. 3.1 SF 6 MixtureGet price

Anisotropic reactive ion etching of silicon using gaz sf6/O2/CHF3

T1 - Anisotropic reactive ion etching of silicon using sf 6/O2/CHF3 gas mixtures. AU - Legtenberg, R. AU - Legtenberg, Rob. AU - Jansen, Henricus V. AU - de Boer, Meint J. AU - Elwenspoek, Michael Curt. PY - 1995/6. Y1 - 1995/6. N2 - Reactive ion etching of silicon in an RF parallel plate system, using Sulfr hexafluoride/O2/CHF3, plasmas has been studied.Get price

Separation of sf6 gas from Gas Mixtures Using Gas Hydrate

Jul 27, 2010 · This study aims to examine the thermodynamic feasibility of separating sulfur hexafluoride (insulating gas), which is widely used in various industrial fields and is one of the most potent greenhouse gases, from gas mixtures using gas hydrate formation. The key process variables of hydrate phase equilibria, pressure−composition diagram, formation kinetics, and structure identification of the mixed gasGet price

Gaseous Dielectrics - 1st Edition - Empowering Knowledge

The Influence of Impurities on the Dielectric Strength of sf6 gas for Positive Polarity; The Nature of Initiatory Electrons Formation and Stability of SF5 and S2F10 SOF4 Production in Spark Breakdown of gaz sf6/O2 Mixtures Assay of insulating gas and Spark-Decomposed sf 6 for Mutagenic Activity in the CHO/HGPRT Mammalian Cell System Chapter 4: Diagnostics/Field ProbesGet price

Sulfr hexafluoride Gas Properties -

the nitrogen content of air by sf 6 (the gaseous mixture consisted of 79 % sf6 gas and 24 % oxygen): five mice were then immersed in this atmosphere for 24 hours, without feeling any ill effects. It is a gas which the speed of soundGet price

Solvay Special Chemicals

N2 mixtures through to the separation of sf 6/N2 mixtures at end of service life or whenever required. For this long time lasting technology Solvay has developed steps in filling, mixing and separation technology. Fig. 11 Gas insulated line for Sulfr hexafluoride / N2 mixture in a tunnel 245 – 550 kV (Siemens, Germany) Fig. 10 Polyethylene coated GIL system forGet price

Sulfur Hexafluoride insulating gas Safety Data Sheet SDS P4657

Formula : Sulfr hexafluoride 1.2. Relevant identified uses of the substance or mixture and uses advised against Use of the substance/mixture : Industrial use. Use as directed. 1.3. Details of the supplier of the safety data sheet Praxair, Inc. 10 Riverview Drive Danbury, CT 06810-6268 - USA T 1-800-772-9247 (1-800-PRAXAIR) - F 1-716-879-2146 1.4.Get price

Comparison of Partial Discharges in sf 6 and Fluoronitrile/CO2

Oct 03, 2017 · mixture and SF 6 have almost the same PDIV under 11.6psi, 14.5 psi and 17.4psi. Both slightly lower than 20% mixture. • PD counts in SF 6 are in-between 15% and 20% mixture. • SF 6 has much more PDs with low magnitude and the 20% fluoronitrile/CO 2 mixture has less PDs but with higher magnitude.Get price

Cr and CrOx etching using sf6 gas and O2 plasma

fluorine–oxygen-based plasma. Two cases are studied to demonstrate the Cr etch performance: (i) a plasma mixture of SF 6 +O 2 and (ii) a switching SF 6/O 2 procedure in which the plasmas are used sequentially. The proposed mixture performs with Cr etch rates (ERs) up to 400nm/min at 300W platen power and is highest when the SF 6/OGet price

insulating gas Gas or Sulfur Hexafluoride Gas Properties | Electrical4U

History of insulating gasChemical Properties of sf6 gas GasElectrical Properties of gaz sf6 GasSulfr hexafluoride or sulfur hexafluoride gas molecules are combined by one sulfur and six fluorine atoms. This gas was first realized in the year 1900 in the laboratories of the Faculte de Pharmacie de, in Paris. In the year of 1937, General Electrical Company first realized that sf6 gas gas could be used as gaseous insulating material. After the Second World War, i.e. in the middle of 20th century, the popularity of using sulfur hexafluoride gas as an insulating material in electrical system was rising very r...Get price

Breakdown Gradients in sf6 gas-N2, gaz sf6-Air and insulating gas-CO2 Mixtures

Abstract: A method to calculate the uniform field breakdown gradients for sf6 gas-N2, sf6 gas-air and gaz sf6-CO2 mixtures is discussed. Calculated values of the breakdown gradients in these mixtures are compared with experimentally measured values using plane-plane electrode configuration and direct applied voltages.Get price

Cold Weather Applications of Gas Mixture (gaz sf6/N2, insulating gas/CF4

4 mixture: •This mixture first became available in 1991; since then Manitoba Hydro has standardized on this mixture for all new breakers •50/50 mixture •Filling pressure (at 20ºC): 0.36 MPa SF 6 + 0.34 MPa CF 4 • Alarm pressure (20ºC): 0.62 Mpa • Blocking pressure (20ºC): 0.60 MPa MIXED GAS CIRCUIT BREAKERSGet price

Separation of gaz sf6 from Binary Mixtures with N2 Using

(2011). Separation of Sulfr hexafluoride from Binary Mixtures with N2 Using Commercial Poly(4-Methyl-1-Pentene) Films. Separation Science and Technology: Vol. 46, No. 8, pp. 1231-1240.Get price

The Decomposition Products of Sulfur Hexafluoride (gaz sf6) with

Inorganics 2017, 5, 68 2 of 7 2. Results and Discussion The reactions between the alkali metals dissolved in liquid ammonia and gaz sf6 lead to the formation of the respective products (Equation (2)) that Demitras and MacDiarmid predicted for the reaction ofGet price