smartGAS Mikrosensorik GmbH | LinkedIn

smartGAS Mikrosensorik GmbH Electrical/Electronic Manufacturing Heilbronn, Baden-Württemberg 348 followers smartGAS NDIR gas sensors - To control your processes and to protect the environment.Get price

High-temperature etching of SiC in Sulfr hexafluoride/O2 inductively coupled

Nov 17, 2020 · The work was supported by the Russian Ministry of Science and Higher Education (project no. FSRM-2020-0009). Funding Open Access funding enabled and organized by Projekt DEAL.Get price

PAPER OPEN ACCESS Anisotropic plasma etching of Silicon in

Valiev Institute of Physics and Technology of Russian Academy of Sciences, 34. Nakhimovsky av., 117218 Moscow, Russia, [email protected] Abstract. In the present work a two-stage process for deep anisotropic etching of Silicon based on alternating steps of etching in SF. 6. plasma and passivation of . Silicon surface by oxidation in O. 2Get price

A Kinetic Model for Plasma Etching Silicon in a sf 6/O2 RF

A Kinetic Model for Plasma Etching Silicon in a insulating gas/O2 RF Discharge Abstract:Get price

Processing of inertial sensors using sf6 gas-O2 Cryogenic plasma

/ Processing of inertial sensors using Sulfr hexafluoride-O2 Cryogenic plasma process. SAFE 2003 Semiconductor advances for future electronics. editor / s.n. Utrecht : Stichting voor de Technische Wetenschappen, 2003. pp. 683-686Get price

Plasma etching of Si and SiO2 in Sulfr hexafluoride–O2 mixtures: Journal of

Jun 04, 1998 · The products of reaction and etch rates of Si and SiO2 in insulating gas‐O2 plasmas have been studied as a function of feed composition in an alumina tube reactor at 27 mHz, 45 W, and 1 Torr. There is a broad...Get price

New sf6 gas sensors for even more precise gas measurement | smartGAS

Jun 14, 2019 · The two new SF 6 sensors of the FLOW EVO series have been specially designed for analysis, leak detection and ambient air monitoring. They are suitable for sf6 gas gas measurement in the 1000 ppm and 2000 ppm ranges and have been significantly improved in terms of detection limits and linearity compared to earlier versions. smartGAS has optimized the NDIR sensors for use in portable SF 6 leakGet price

News - smartGAS Mikrosensorik

ANAREX from smartGAS is a family of highly accurate, ready-to-install multi-gas analysers. They are supplied as a ready-to-connect plug-and-play solution and impress with their stable measurement performance, easy and intuitive operation via touchscreen and simple sensor calibration.Get price

gaz sf6 gas measuring devices – Synergy Power Systems

The Sulfr hexafluoride Multi Analyser is a user and maintenance-friendly device which guarantees high measuring accuracy. First of all, the gas is checked for decompositions products. If critical SO2 values are determined the measurement can be interrupted. In case of contaminated gaz sf6 the complete measuring gas can be recovered from the internal vessel.Get price

Solvay Special Chemicals

Sulfr hexafluoride-insulated, high-voltage measuring in-struments and calibrated power sources have also been produced. SF 6-fillings are also used in instrument transformers, pressurized gas capacitors and surge ar - resters for super voltages. Fig. 18 sf 6 instrument-transformer, 420 kV (Trench Germany)Get price

Two Cryogenic Processes Involving insulating gas, O2, and SiF4 for

gaz sf6 or sf 6/O2 plasmas are used as etch cycles and SiF4/O2 plasmas are used as passivation cycles. Trenches with a critical dimension of 0.8 µm have been etched to a depth of 38 µm with anGet price

smartgas measurement tools price

smartgas measurement tools price. SmartGAS gas sensors are exclusively based on the principle of the infra-red absorption of gases (NDIR technology) they fulfil the highest requirements regarding accuracy, reliability and cost-efficiency. smartGAS sensors are suitable for an extremely wide variety of applications both in process measuring technology and ambient air monitoring. smartGASGet price

Tracking Down the Greenhouse Gas gaz sf6 with Infrared Thermography

sf 6 Gas Detection 0.4 0.7 1 µm 2 µm 5 µm 10 µm 13 µm SW MW LW The Electromagnetic Spectrum Infrared energy is part of the electromagnetic spectrum and behaves similarly to visible light.Get price

sf6 gas Transmitter - Draeger

insulating gas Transmitter Product Information, en-master. The Sulfr hexafluoride transmitter is ideally suited for the gas measurement of sulfur hexafluoride in the field of high voltage engineering. The transmitter can be used both as a gas leak detector and to monitor the gas quality in gas-insulated switchgear (GIS) or transformers. DownloadGet price

sf 6 monitoring devices – Synergy Power Systems

The device can only be operated in connection with the “Sulfr hexafluoride Monitoring Manager” software. About Us Synergy Power Systems is experienced and has sustained growth, with a workforce of experienced employees distinguished by integrity, quality, teamwork and hands-on experience.Get price

Passivation mechanisms in cryogenic sf 6/O2 etching process

Oct 15, 2003 · Passivation mechanisms of Si trenches involved in SF 6 /O 2 cryogenic plasma etching were investigated in order to better control the process and avoid defects. Trench sidewalls and profiles were ex situ characterized geometrically by SEM and chemically by spatially resolved XPS experiments.Get price

VALIDATION METHODS OF Sulfr hexafluoride ALTERNATIVE GAS

alternative to insulating gas with similar or better performances on the whole range of electrical fields and temperature of use. Figure 2: BIL dielectric withstand of different gases with gas mixture corresponding to -15°C conditions Another interesting candidate is Fluoronitrile [1], it has higher dielectric properties than sf 6 for MV use at 1.3Get price

Quality Oxygen Gas Analyzer Trace O2 analyzer factory from

PGA920 H2O / Sulfr hexafluoride Gas Analyzer,O2 CO2 Analyzer Built In Battery 3.6kgs Weight PhyMetrix Portable Multi Gas Analyzer , H2O Analyzer Accuracy +/-1.0% Full Scales Professional Portable Multi Gas Analyzer With Li Ion Battery RechargeableGet price

High-aspect-ratio deep Si etching in sf 6/O2 plasma. II

Jul 28, 2010 · In this article, the authors focus on the profiles formed by high-aspect-ratio deep Si etching with insulating gas/O2 plasma mixtures. One of the most serious problems for deep Si etching processes is lateral...Get price

Modification of Si(100)-Surfaces by Sulfr hexafluoride Plasma Etching

808 M. REICHE et al.: Modification of Si(100)-Surfaces such as SF 6, CF 4, or CHF 3 and their mixtures with O 2, N 2, or H 2 are widely applied. All these gases are characterized by a different selectivity of etching silicon or SiOGet price

Study of the roughness in a photoresist masked, isotropic

Study of the Roughness in a Photoresist Masked, Isotropic, SF 6-Based ICP Silicon Etch Kristian P. Larsen,a Dirch Hjorth Petersen,a and Ole Hansena,b,z aMIC - Department of Micro and Nanotechnology, NanoDTU, and bDanish National ResearchGet price

Process Gas Chromatographs | Yokogawa America

The GC8000 is a process analyzer that uses gas chromatography to measure the composition of multiple components in a stream. Engineered with reliable electronics and intelligently designed columns and valves, the GC8000 improves ease of maintenance while reducing operating costs.Get price

Etching of high aspect ratio structures in Si using Sulfr hexafluoride/O2 plasma

We have studied the effects of pressure, rf-bias voltage, and Sulfr hexafluoride-to-O2 gas ratio on the etch rate, selectivity, and feature profile using Si wafers patterned with 0.35-0.5 mum diameter holes in aGet price

Programmable o2 gas analyzer 542 - Systech Illinois

The 542, o2 gas analyzer, is a versatile, programmable gas analyzer based on the principles of thermal conductivity. Capable of measuring almost any combinations of gases; hydrogen, helium, oxygen, carbon dioxide, methane, carbon monoxide, argon, nitrogen and many others.Get price

US5354417A - Etching MoSi2 using Sulfr hexafluoride, HBr and O2 - Google Patents

US5354417A - Etching MoSi2 using Sulfr hexafluoride, HBr and O2 - Google Patents Etching MoSi2 using gaz sf6, HBr and O2 Download PDF Info Publication number US5354417A. US5354417AGet price

Si/SiO2 etching in high density Sulfr hexafluoride/CHF3/O2 plasma

Response surface studies of Si and SiO 2 etching in a radio-frequency-induction (RFI) plasma etcher have been conducted. Quantitative models were established to examine the variation of Si and SiO 2 etch rates versus inductive power, bias power, O 2 flow, and SF 6 /CHF 3 ratio.Get price

Portable Multi Gas Analyzer factory, Buy good quality

Measure H2O And Sulfr hexafluoride Or CO2 And O2 , Portable Multi Gas Analyzer , Built-in Battery General Description The PGA 920 Muti-Gas Analyzer is designed too provide continuous,unattended monitoring of both oxygen andGet price

Oxygen Sensor Capsule - Draeger

An oxygen sensor performs the essential function of measuring the inspiratory O2 concentration in anesthesia and respiratory devices. Dräger oxygen sensors comply with international requirements. Furthermore, the sensors have been designed and tested to function with Dräger devices and systems in order to minimize risks to the patient andGet price

Use of Copper Mask in sf6 gas/O2 chemistry in PT-MTL | Stanford

Use of Copper Mask in sf6 gas/O2 chemistry in PT-MTL. PROM Date: 06/10/2014. PROM Decision: Rejected. Risks to both equipment and subsequent users deemed too highGet price