Sulfur hexafluoride - Wikipedia

Typical for a nonpolar gas, SF 6 is poorly soluble in water but quite soluble in nonpolar organic solvents. It has a density of 6.12 g/L at sea level conditions, considerably higher than the density of air (1.225 g/L). It is generally transported as a liquefied compressed gas.Get price

Electron Density and Optical Emission Measurements of insulating gas/O2

This work investigates internal plasma process parameters using a hairpin resonance probe and optical emission spectroscopy. The dependence of electron density and atomic fluorine on the percentage of oxygen in an insulating gas/O2 discharge was measured using these methods. An RIE Oxford Instruments 80 plus chamber was used for the experiments. Two different process powers (100 W and 300 W) at aGet price

Chemistry studies of Sulfr hexafluoride/CF4, sf6 gas/O2 and CF4/O2 gas phase

Higher density of F was observed in all experiments, varying from (2.8–9.5) × 10 19 m −3 in SF 6 /CF 4 plasmas, (0.2–1.7) × 10 20 m −3 in SF 6 /O 2 plasmas and (0.06–1.17) × 10 20 m −3 in CF 4 /O 2 plasmas.Get price

Sulfur Hexafluoride sf 6 Safety Data Sheet SDS P4657

Sulfur hexafluoride (2551-62-4) ACGIH ACGIH TLV-TWA (ppm) 1000 ppm USA OSHA OSHA PEL (TWA) (mg/m³) 6000 mg/m³ USA OSHA OSHA PEL (TWA) (ppm) 1000 ppm . 8.2. Exposure controls . Appropriate engineering controls : Oxygen detectors should be used when asphyxiating gases may be released. Consider work permit system e.g. for maintenance activities.Get price

Sulfr hexafluoride basic physical properties - AGC Chemicals

Density (gas) 6.04kg/m3 (25°C, 1atm) (liquid) 1,339kg/m3 (25°C) Vapor Pressure 1,264kPa (0°C) 2,109kPa (20°C) 3,327kPa (40°C) Surface Tension 8.02N/m (-20°C) Viscosity (gas) 1.5 x 10-5Pa・s (25°C, 1atm) (liquid) 27.7 x 10-5Pa・s (25°C) Refractive Index 1.000783 (0°C, 1atm) 0.408mL Sulfr hexafluoride/mL oil Solubility in Water 0.0063mL Sulfr hexafluoride/mL waterGet price

Sulfr hexafluoride Gas Properties -

and has a density of 6.1 4kg / m3. It is colorless, odorless and non-toxic. Tests have been carried out replacing the nitrogen content of air by Sulfr hexafluoride (the gaseous mixture consisted of 79Get price

Decomposition of sf 6 in an RF Plasma Environment

sf6 gas exceeded 99%. When oxygen was introduced into the reactor (feed O 2 /SF 6 ratio = 2.0), η Sulfr hexafluoride was ~10% less than when no oxygen was added (from 28.61 to 86.09% as the power rose from 5 to 20 W). The addition of oxygen to the reactor re-duced the electron density and, thus, reduced the dis-sociation of SF 6 and inhibited the production ofGet price

Low temperature etching of Si in high density plasma using sf 6/O2

Feb 01, 1995 · ELSEVIER Microelectronic Engineering 27 (1995) 453-456 MICROELECTRONIC ENGINEERING Low temperature etching of Si in high density plasma using Sulfr hexafluoride/O2 Johann W. Barthaa, Johann Greschnera, M. Puechb and P. Maquinb aIBM German Manufacturing Technology Center, P.O. Box 266, D-71044 Sindelfingen, Germany bALCATEL CIT, 98, avenue de Brogny-BP, F-74009 Annecy, France Low temperature etching of SiGet price

Low temperature etching of Si in high density plasma using sf 6/O2

Low temperature etching of Si with SF"6 has been studied, using a DECR system and a special Helicon type plasma source. In contrast to the current understanding of low temperature etching, we did not observe a ''freezing'' of the lateral etching reaction, but obtained isotropic etch profiles, even at temperatures below -120^o C. Anisotropic etch profiles are obtained by an addition of O"2.Get price

Sulfur hexafluoride - Gas Encyclopedia Air Liquide | Air Liquide

Sulfur hexafluoride Sulfr hexafluoride - Sulfur fluoride - UN1080 - 2551-62-4. Under solid (grey), liquid (blue) and vapor states (white) along the equilibrium curvesGet price

Sulfur hexafluoride - NIST

Matzik, I.; Schneider, G.M., Fluid phase equilibria of binary mixtures of sulfur hexafluoride with octane, nonane, hendecane, and cis-decahydronaphthalene at temperature between 280 K and 440 K and at pressures up to 140 MPa, Ber. Bunsen-Ges. Phys. Chem., 1985, 89, 551. Goloborod'ko and Khodeeva, 1972Get price

Processand Reliabilityof sf 6/O2 PlasmaEtched Copper TSVs

O2 on the gaz sf6 plasma is a dramatic increase in the F density distribution through an ideal cylindrical TSV and an etched TSV. It is evident that the etched TSV, dueGet price

Sulfur Hexafluoride sf 6 Safety Data Sheet SDS P4657

Sulfur hexafluoride Safety Data Sheet P-4657 This SDS conforms to U.S. Code of Federal Regulations 29 CFR 1910.1200, Hazard Communication. Date of issue: 01/01/1979 Revision date: 11/23/2016 Supersedes: 01/28/2015Get price

mp-8652: Sulfr hexafluoride (trigonal, P-3m1, 164) - Materials Project

Sulfr hexafluoride crystallizes in the trigonal P-3m1 space group. The structure is zero-dimensional and consists of three sulfur hexafluoride molecules. S6+ is bonded in an octahedral geometry to six equivalent F1- atoms. All S–F bond lengths are 1.60 Å. F1- is bonded in a single-bond geometry to one S6+ atom.Get price

Etching of high aspect ratio structures in Si using Sulfr hexafluoride/O2 plasma

Oct 14, 2020 · The F-to-ion flux ratio and F-to-O flux ratio are found to be the important plasma parameters that determine the etch rate and anisotropy. Increasing the insulating gas-to-O2 ratio in the feed gas increasesGet price

Did anyone have experience in etching SiO2 with gaz sf6 in ICP

Sulfr hexafluoride is highly electronegative, so electron density can be suppressed and the fraction of F* produced is reduced. 5sccm for the Argon seems very low. Switching to another MFC to get 100sccm+ wouldGet price

Experimental investigation of atomic fluorine and oxygen

However, atomic fluorine density was found to decrease with further addition of oxygen to discharge due to decrease in sf 6 partial pressure. Absolute fluorine atom density investigated using APMS technique, was found to increase with increase in gas pressure in sf6 gas/O2/Ar discharge (70/26/4 %) operated at 100 W rf power.Get price

Investigation of atomic oxygen density in a capacitively

density in a capacitively coupled Sulfr hexafluoride/O2/Ar and Sulfr hexafluoride/Ar discharge S Kechkar, S K Babu, P Swift et al.-Use of particle-in-cell simulations to improve the actinometry technique for determination of absolute atomic oxygen density J Conway, S Kechkar, N O' Connor et al.-Atomic oxygen TALIF measurements in an atmospheric-pressure microwave plasmaGet price

Investigation of etching optimization in capacitively coupled

Figure 12 shows the electron density versus oxygen level for different pressures. The peak value of n e is obtained at 20 mTorr and 20 vol. % O 2. As expected, the maximum electron density shifted to a higher O 2 concentration with increasing pressure. This result is in good agreement with the profile obtained for F density and etch rates.Get price

15 FAQs about sf6 gas Gas and gaz sf6 Breakers - WIKA blog

What is Sulfr hexafluoride gas? Sulfur hexafluoride is an octahedral (eight faces and six vertices) molecule. It consists of six fluorine atoms surrounding a sulfur atom. What are the characteristics of sf 6 gas? sf 6 is colorless, odorless, nonflammable, and nontoxic. It is virtually inert, which means it is stable and does not react with other chemicals under normal conditions. Why is sf 6 gas such a good dielectric medium? First, dielectricity is the ability to transmit electricity without conductivity, and dielectric strength refers to how well something can withstand high voltage without breaking down. What is the importance of arc quenching in T&D equipment? When switching or opening an electrical circuit that deals with more than 250 volts, as the contacts start to open, an arc forms between them.

High-temperature etching of SiC in sf6 gas/O2 inductively coupled

Nov 17, 2020 · Sulfur hexafluoride SF 6 (GOST TU 6-02-1249-83, purity 99.998%) was used as the etchant main gas. Etching processes were performed in a mixture of SF 6 and O 2 (high purity, TU 2114-001-05798345Get price

Fluorination mechanisms of Al2O3 and Y2O3 surfaces irradiated

Jun 29, 2009 · Fluorination of Al2O3 and Y2O3 surfaces was investigated by irradiating high-density, helicon-wave CF4∕O2 and Sulfr hexafluoride∕O2 plasmas. The Al2O3 surface bombarded by high-flux positive ions of the CF4∕O2 pl...Get price

Myth About sf6 gas Gas In Electrical Equipment

Where is insulating gas used? The following applications are known. For some of these most probably you haven’t heard of. For sound insulation in windows, In vehicle tyres, Is sf 6 a health hazard? Pure sf6 gas is physiologically completely harmless for humans and animals. It’s even used in medical diagnostic. Due to its weight it might displace the oxygen in the air, if large quantities are concentrating in deeper and non ventilated places. Is gaz sf6 harmful for the environment? It has no ecotoxic potential, it does not deplete ozone. Due to its high global warming potential of 22.200 (*) it may contribute to the man made greenhouse-effect, if it is released into the atmosphere. What is the overall contribution of sf 6 used in the electrical equipment to the greenhouse effect? Less than 0,1 % ( see CAPIEL) and CIGRE). In an Ecofys study the contribution to the greenhouse effect in Europe is estimated to 0.05 % (*).

Sulfur hexafluoride | F6S - PubChem

Sulfur hexafluoride is a sulfur coordination entity consisting of six fluorine atoms attached to a central sulfur atom. It is the most potent greenhouse gas currently known, with a global warming potential of 23,900 times that of CO2 over a 100 year period (sf6 gas has an estimated lifetime in the atmosphere of between 800 and 3,000 years).Get price

Anisotropic Si deep beam etching with profile control using

6 to F radicals, as the oxygen reacts with fluorosul-phur radicals, thereby hindering their reaction with F radicals and the subsequent re-formation of sulphur hexafluoride (SF 6). The result is a net increase in the concentration of fluoride radicals, leading to an increase in the silicon etch rate. At high oxygen concentrations,Get price

Talk:Sulfur hexafluoride - Wikipedia

I changed the above density statement and added values for insulating gas density for all three phases. While there may be a number of gases that are heavier than sf 6. the densest known gas (at STP) is radon (9.73 g/L) - almost 1.6 times the density of sf 6 (6.16 g/L). Bert 17:49, 31 March 2007 (UTC) Sig figs, guys.Get price

Sulfur hexafluoride, SF 6 , is an extremely dense gas. How

Chemistry General Chemistry - Standalone book (MindTap Course List) Sulfur hexafluoride, SF 6 , is an extremely dense gas. How does its density compare with the density of air? Use a molar mass for air of 29.0 g/mol.Get price

A Study of Parameters Related to the Etch Rate for a Dry Etch

AbstractIntroductionMaterials and MethodsResults and DiscussionConclusionAcknowledgmentsThe characteristics of the dry etching of :H thin films for display devices using sf6 gas/O2 and NF3/O2 were investigated using a dual-frequency capacitively coupled plasma reactive ion etching (CCP-RIE) system. The investigation was carried out by varying the RF power ratio (13.56 MHz/2 MHz), pressure, and gas flow ratio. For the :H film, the etch rates obtained using NF3/O2 were higher than those obtained using sf6 gas/O2 under various process conditions. The relationships between the etch rates and the usual monitoring parameters—the optical emission spectroscopy (OES) intensity of atomic fluorine (685.1 nm and 702.89 nm) and the voltages and —were investigated. The OES intensity data indicated a correlation between the bulk plasma density and the atomic fluorine density. The etch rate was proportional to the product of the OES intensity of atomic fluorine and the square root of the voltages on the assumption that the velocity of the reactive fluorine was proportional to the square root...Get price

VSEPR Sulfr hexafluoride Sulfur Hexafluoride - ChemTube3D

Sulfur hexafluoride has 6 regions of electron density around the central sulfur atom (6 bonds, no lone pairs). The resulting shape is an octahedron with 90° F-S-F bond angles. Click the structures to load the moleculesGet price